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Free with trial Seamless pattern fabrication circuit board cartoon. multilayer substrate, vias silkscreen, copper laminate fabrication circuit board sign vector. Substrate vectors Seamless pattern fabrication circuit board cartoon vector. Seamless pattern fabrication circuit board cartoon. multilayer substrate, vias silkscreen, copper. seamless pattern fabrication circuit board cartoon. multilayer substrate, vias silkscreen, copper laminate fabrication circuit board sign vector
Free with trial Aquarium with colorful fish, plants, coral, seashell, and sandy substrate in teal. Base. Substrate vectors Aquarium with colorful fish, plants, coral, seashell, and sandy substrate in teal. Base
Free with trial Anisotropic Etch: line art icon showing why plasma etching cuts straight down. A resist mask sits on a substrate with one opening, and from a point just below that gap a fan of arrows spreads into the material. Each length represents removal speed in its direction: longest pointing down, shorter at 25 and 57 degrees, shortest sideways. Because the downward rate far exceeds the lateral one, the cavity deepens while its walls stay vertical and aligned with the mask edges, with almost no undercut. In reactive ion etching this comes from ions accelerated perpendicular to the wafer plus a thin passivating film that protects each sidewall. The ratio between vertical and sideways speed defines anisotropy, vital for dense, high aspect ratio features such as deep trenches and contacts. Schematic, not to scale. Clean with no text, suited to microelectronics, cleanroom training, presentations and infographics. Part of the Semiconductor Manufacturing series of icons and process diagrams. Substrate vectors Anisotropic Etch : etch-rate arrows from a mask opening, long downward and short sideways, line icon. Anisotropic Etch: line art icon showing why plasma etching. Anisotropic Etch: line art icon showing why plasma etching cuts straight down. A resist mask sits on a substrate with one opening, and from a point just below that gap a fan of arrows spreads into the material. Each length represents removal speed in its direction: longest pointing down, shorter at 25 and 57 degrees, shortest sideways. Because the downward rate far exceeds the lateral one, the cavity deepens while its walls stay vertical and aligned with the mask edges, with almost no undercut. In reactive ion etching this comes from ions accelerated perpendicular to the wafer plus a thin passivating film that protects each sidewall. The ratio between vertical and sideways speed defines anisotropy, vital for dense, high aspect ratio features such as deep trenches and contacts. Schematic, not to scale. Clean with no text, suited to microelectronics, cleanroom training, presentations and infographics. Part of the Semiconductor Manufacturing series of icons and process diagrams.
Free with trial Seamless pattern nanotechnology microchip frame cartoon. fabrication lithography, wafer substrate, photolithography etching nanotechnology microchip frame sign vector. Substrate vectors Seamless pattern nanotechnology microchip frame cartoon vector. Seamless pattern nanotechnology microchip frame cartoon. fabrication lithography, wafer substrate. seamless pattern nanotechnology microchip frame cartoon. fabrication lithography, wafer substrate, photolithography etching nanotechnology microchip frame sign vector
Free with trial Black and white line art of a silicon wafer with a V-shaped orientation notch, dashed edge exclusion ring and a symmetric grid of chip dies. Shows the circular single-crystal substrate every microchip is built on. Clean icon for semiconductor manufacturing, chip fabrication, electronics, engineering and technology education. Part of the Semiconductor Manufacturing series of icons and process infographics. Substrate vectors Silicon wafer line icon with orientation notch and die grid, Semiconductor Manufacturing series. Black and white line art of a silicon wafer with a V-shaped. Black and white line art of a silicon wafer with a V-shaped orientation notch, dashed edge exclusion ring and a symmetric grid of chip dies. Shows the circular single-crystal substrate every microchip is built on. Clean icon for semiconductor manufacturing, chip fabrication, electronics, engineering and technology education. Part of the Semiconductor Manufacturing series of icons and process infographics.
Free with trial Line icon of isotropic etching, where material is removed at the same speed in every direction. A mask strip sits on a substrate that has been eaten away from both sides, leaving quarter-circle cavities beneath its overhanging edges and a narrow neck in the centre. From each mask corner, three arrows of equal length point down, diagonally and sideways, so the lateral undercut matches the depth. Typical of wet chemistry. Schematic, not to scale. Substrate vectors Isotropic Etch : mask undercut from both sides by an equal-rate etch, quarter-circle profile, line icon. Line icon of isotropic etching, where material is. Line icon of isotropic etching, where material is removed at the same speed in every direction. A mask strip sits on a substrate that has been eaten away from both sides, leaving quarter-circle cavities beneath its overhanging edges and a narrow neck in the centre. From each mask corner, three arrows of equal length point down, diagonally and sideways, so the lateral undercut matches the depth. Typical of wet chemistry. Schematic, not to scale.
Free with trial Photoresist Layer: line art icon showing how a light-sensitive coating is applied in photolithography. A dispense nozzle at the top releases a droplet of liquid resist toward the centre of a notched silicon wafer. Curved arrows on each side show the substrate spinning at high speed, which spreads the polymer outward into a thin, uniform film and throws any excess off the rim. A raised ring near the outer edge represents the bead that spin coating leaves behind. A narrow gap separates this band from the base below, so the resist reads as its own layer. After a soft bake, the film is exposed through a photomask and developed, transferring the circuit pattern onto the chip. Schematic illustration, not to scale. Clean with no text, suited to semiconductor manufacturing, microelectronics, chip design, engineering training, presentations and infographics. Part of the Semiconductor Manufacturing series of icons and process infographics. Substrate vectors Photoresist Layer - resist droplet dispensed onto a spinning silicon wafer, spin coating line icon. Photoresist Layer: line art icon showing how a light. Photoresist Layer: line art icon showing how a light-sensitive coating is applied in photolithography. A dispense nozzle at the top releases a droplet of liquid resist toward the centre of a notched silicon wafer. Curved arrows on each side show the substrate spinning at high speed, which spreads the polymer outward into a thin, uniform film and throws any excess off the rim. A raised ring near the outer edge represents the bead that spin coating leaves behind. A narrow gap separates this band from the base below, so the resist reads as its own layer. After a soft bake, the film is exposed through a photomask and developed, transferring the circuit pattern onto the chip. Schematic illustration, not to scale. Clean with no text, suited to semiconductor manufacturing, microelectronics, chip design, engineering training, presentations and infographics. Part of the Semiconductor Manufacturing series of icons and process infographics.
Free with trial The image displays a close-up view of an Intel processor chip. The central component features the recognizable Intel logo and intricate circuitry, surrounded by a grid of gold-plated contact pads. The chip is mounted on a dark, likely heat-spreading substrate, indicating its role in high-performance computing applications. The design emphasizes the complexity and precision of modern CPU. Substrate vectors Intel processor chip showcasing intricate internal design and gold-plated contacts. The image displays a close-up view of an Intel processor chip. The central. The image displays a close-up view of an Intel processor chip. The central component features the recognizable Intel logo and intricate circuitry, surrounded by a grid of gold-plated contact pads. The chip is mounted on a dark, likely heat-spreading substrate, indicating its role in high-performance computing applications. The design emphasizes the complexity and precision of modern CPU
Free with trial Atomic Layer Deposition: a line icon of the cyclic technique that grows ultra-thin films one atomic layer at a time. A ring of four clockwise arrows connects the steps of a single cycle. At the top, a three-armed precursor molecule represents the first reactant pulse at the bottom, a smaller bent molecule represents the second. Short parallel strokes on either side mark the inert gas purges that clear excess reactants between pulses. In the centre, a substrate supports two completed monolayers, topped by a row of ligand-capped surface sites showing how each pulse stops once every available site is occupied. This self-limiting behaviour gives ALD exceptional thickness control and conformal coverage, which is why fabs rely on it for high-k gate dielectrics, FinFET and gate-all-around spacers and memory capacitors. Useful for semiconductor training material, nanotechnology explainers, engineering slides, research posters and electronics industry content. Substrate vectors Atomic Layer Deposition (ALD). Alternating precursor pulses and purges grow a thin film one atomic layer at a time. Atomic Layer Deposition: a line icon of the. Atomic Layer Deposition: a line icon of the cyclic technique that grows ultra-thin films one atomic layer at a time. A ring of four clockwise arrows connects the steps of a single cycle. At the top, a three-armed precursor molecule represents the first reactant pulse at the bottom, a smaller bent molecule represents the second. Short parallel strokes on either side mark the inert gas purges that clear excess reactants between pulses. In the centre, a substrate supports two completed monolayers, topped by a row of ligand-capped surface sites showing how each pulse stops once every available site is occupied. This self-limiting behaviour gives ALD exceptional thickness control and conformal coverage, which is why fabs rely on it for high-k gate dielectrics, FinFET and gate-all-around spacers and memory capacitors. Useful for semiconductor training material, nanotechnology explainers, engineering slides, research posters and electronics industry content.
Free with trial Etch Selectivity: line art icon of the property that lets a fab clear one film while sparing the material next to it. Two blocks share a substrate and receive an identical shower of ions. On the left, the arrows travel down into empty space, and a dashed outline marks where the target stood before most of it was cleared. On the right, a dotted block keeps its full height, its top surface untouched. Selectivity is expressed as a ratio of etch rates, for example 20:1, meaning twenty nanometres of target vanish for every nanometre lost from the neighbour. Chemistry provides it: gases are chosen to form volatile products with silicon, oxide or nitride but not with the protected layer, then ion energy and gas mix are tuned. A high ratio safeguards thin gate oxides, masks and stop layers. Schematic, not to scale. Clean with no text, suited to microelectronics, training, presentations and infographics. Part of the Semiconductor Manufacturing series of icons and process diagrams. Substrate vectors Etch Selectivity : same ions hit two materials the target etches deep, the neighbour stays intact, line icon. Etch Selectivity: line art icon of the property. Etch Selectivity: line art icon of the property that lets a fab clear one film while sparing the material next to it. Two blocks share a substrate and receive an identical shower of ions. On the left, the arrows travel down into empty space, and a dashed outline marks where the target stood before most of it was cleared. On the right, a dotted block keeps its full height, its top surface untouched. Selectivity is expressed as a ratio of etch rates, for example 20:1, meaning twenty nanometres of target vanish for every nanometre lost from the neighbour. Chemistry provides it: gases are chosen to form volatile products with silicon, oxide or nitride but not with the protected layer, then ion energy and gas mix are tuned. A high ratio safeguards thin gate oxides, masks and stop layers. Schematic, not to scale. Clean with no text, suited to microelectronics, training, presentations and infographics. Part of the Semiconductor Manufacturing series of icons and process diagrams.